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OML의 저널논문, 특허, 학회지논문에 대한 정보를 공유하는 공간입니다.

[USA] Inspection apparatus and inspection method

The present inventive concepts comprises linearly  polariz­ ing light, splitting the linearly polarized light into a first light and a second light, modulating the first light and the second light to have a phase difference to produce an output wave light, converting the output wave light to have a linear shape in a first direction to radiate the converted output wave light to a measured object, receiving a measurement light coming out of the measured object and linearly polarizing the first light and  the second  light of the measurement light to generate an interference light, and obtaining from the inter­ ference light an image of the measured object. The measured object can be scanned in a second direction intersecting the first direction or may be scanned rotationally about an axis in  a third  direction  perpendicular to  the first and  second directions.
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[USAPatent]Inspection apparatus and inspection method.pdf (2.4 MB)

광기술연구실
Opitcal Metrology Laboratory

54896 전북 전주시 덕진구 백제대로 567 전북대학교 공과대학 기계시스템공학부 공대 4호관 317호 / Tel : 063-270-4632, Fax : 063-270-2388 / Email : dashi.kim@jbnu.ac.kr